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TEL Mark8
Tel
Mark-8

System Includes:
Configured for 200 mm wafers
Dual Coat and Dual Develop stations
Carrier Station (C/S) 1x4 side load
M12 Process Frame with Main Arm
Environmental Enclosure with ULPA Filtration
Coater Unit, including:
4 Resist Pumps, RPC Pumps
2 Backside Rinses
Top Edge Bead Removal
Stacked / HP/ HP/ COL/COL/ AD/ HP/ COL/ COL Unit
Chamber Temperature and Humidity Controller
Temperature controlled dispense
Filters for Resist and Solvent
Solvent Bath Dummy Dispense
Developer Unit, Including:
E2 Nozzle Dispense for two fluids per DV Unit
Stacked / HP/ HP/ COL/ COL Unit
Filters for Developer and DI Water
Top and Backside DI water Rinse with Trickle Flow
W.E.E Unit
Additions:
Interface Unit for SVGL Micrascan Stepper, Cup Wash, Temperature
Controller Rack, Temp. Controller Monitoring Software, Standard US Safety, Wafer Recovery
Software, Cascade Programming Software, Leak Detection package, Online Communications (GEM
Compliant)
4-5 |
Bu
4-2 |
WEE
2-17 |
HP2-13 |
WDS
2-18 |
DHP2-19 |
HP2-9 |
AD2-5 |
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HP2-14 |
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HP2-10 |
HP2-6 |
STG
1-4 |
Bu
4-3 |
COL2-15 |
DHP2-20 |
COL2-11 |
COL2-7 |
COL2-15 |
HP2-21 |
COL2-12 |
COL2-8 |
STG
1-3 |
EXT
4-6 |
ROBOT |
STG
1-2 |
COL
4-4 |
DEV
2-4 |
DEV
2-3 |
COAT
2-2 |
ARC COAT
2-1 |
STG
1-1 |
P/U
4-1 |
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